80 K cryogenic stage for ice lithography

We present a cryogenic system design and development for ice lithography. The cryo-stage is designed with embedded channels to allow direct liquid nitrogen flow, enabling fast cooling, low sample temperature. stage cools down 78.8 K in 20 min heats up room temperature 15 min, which increases throughput significantly. Compared the previous designs, new reduces cooling time by 85%, it 50 colder. fabricated using copper, aluminum, polyether ether ketone (PEEK) polymer. Numerical simulations show that thermal stress on during process remains well below materials' mechanical yield limits. Finally, lower enables us explore precursors, materials, applications, we demonstrate combining lithography printed flexible electronics technology.